Fluid delivery mounting panel and system

ABSTRACT

A system includes a mounting panel having diffusion-bonded metal plates that form a reservoir to contain a process fluid, multiple channels through which to flow the process fluid, and vias through which to flow the process fluid to and from process fluid control components attached to the mounting panel. At least a pair of the multiple channels are connected with the reservoir. A temperature sensor is attached to a top of the mounting panel, the temperature sensor in fluid communication with the reservoir through one of the vias. A set of inlet ports are attached to the mounting panel, the set of inlet ports to receive the process fluid. At least one outlet port is attached to the mounting panel, the at least one outlet port to output the process fluid from the mounting panel.

RELATED APPLICATIONS

The present application is a division of U.S. patent application Ser.No. 17/244,557, filed Apr. 29, 2021, which is incorporated by referenceherein.

TECHNICAL FIELD

Embodiments of the present disclosure relate to a fluid deliverymounting panel and to a corresponding system.

BACKGROUND

Current process fluid panel, such as gas panels, are designed and builtusing discrete lines, fluid control components, and monitoring sensors.These designs end up being very complicated, taking up significantspace, and costly to implement. The different controlled paths throughsuch panels can be difficult to troubleshoot with so many differentlines and components being routed in all different directions fromprocess fluid sources and to processing destinations, such as processingchambers. The risk of leaks also increases the more couplers, brackets,elbows, and the like that are used in routing the fluid lines. Further,getting such fluid lines to a certain temperature and/or pressure andmaintaining that temperature and/or pressure, such as to preventcondensation and particle build up in the fluid lines, can bechallenging and costly, e.g., often involves temperature control unitsthat take up further space and cost.

SUMMARY

Some of the embodiments described herein cover an apparatus thatincludes a mounting panel including a top plate having multiple vias andmultiple orifices that are sized differently than the multiple vias. Aninternal face of the top plate includes a first cut-out region and aplurality of channels through which to flow a process fluid. The firstcut-out region can be a reservoir in which to contain the process fluid.The multiple vias are adapted for passing the process fluid through thetop plate and the multiple orifices are adapted for attaching aplurality of process fluid control components to the mounting panel. Theapparatus further includes an inner plate having multiple additionalvias. The apparatus further includes a bottom plate, where the innerplate is compacted between the top plate and the bottom plate to form anintegral metallic body in which to contain and flow the process fluid.

In some embodiments, a system includes a mounting panel including aplurality of diffusion-bonded metal plates that form: a reservoir tocontain a process fluid; multiple channels through which to flow theprocess fluid, wherein at least a pair of the multiple channels areconnected with the reservoir; and a plurality of vias through which toflow the process fluid to and from process fluid control componentsattached to the mounting panel. The system further includes atemperature sensor attached to a top of the mounting panel, thetemperature sensor in fluid communication with the reservoir through oneof the plurality of vias. The system further includes a set of inletports attached to the mounting panel, the set of inlet ports to receivethe process fluid. The system further includes at least one outlet portattached to the mounting panel, the at least one outlet port to outputthe process fluid from the mounting panel.

In additional or related embodiments, a method of operating a processfluid delivery system is provided where the system includes a mountingpanel that forms a reservoir to contain a process fluid, multiplechannels through which to flow the process fluid, a plurality of viasbetween a top of the mounting panel and the reservoir and between thetop of the mounting panel and the multiple channels. The system furtherincludes a pressure sensor attached to a top of the mounting panel andthat is in fluid communication with the reservoir. The method ofoperating this system includes causing the process fluid to flow from aninlet port through a first channel of the multiple channels. The methodfurther includes causing the process fluid to flow from the firstchannel through a first valve into a second channel of the multiplechannels, the second channel in fluid communication with the reservoir.The method further includes determining, using the pressure sensor, apressure of the process fluid within the reservoir. The method furtherincludes causing the process fluid to flow from the reservoir into athird channel of the multiple channels.

Numerous other features are provided in accordance with these and otherembodiments of the disclosure. Other features and embodiments of thepresent disclosure will become more fully apparent from the followingdetailed description, the claims, and the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is illustrated by way of example, and not by wayof limitation, in the figures of the accompanying drawings in which likereferences indicate similar elements. It should be noted that differentreferences to “an” or “one” embodiment in this disclosure are notnecessarily to the same embodiment, and such references mean at leastone.

FIG. 1A is an exploded perspective view of a diffusion-bonded mountingpanel and corresponding process fluid delivery system, according to anembodiment of the disclosure.

FIG. 1B is a perspective view of the assembled diffusion-bonded mountingpanel and corresponding process fluid delivery system of FIG. 1Aaccording to an embodiment of the disclosure.

FIG. 1C is a top, plan view of the assembled diffusion-bonded mountingpanel and corresponding process fluid delivery system of FIG. 1Aaccording to an embodiment of the disclosure.

FIG. 2 is a bottom perspective view of a top plate of the mounting panelaccording to an embodiment of the disclosure.

FIG. 3 is a bottom perspective view of an inner plate of the mountingpanel according to an embodiment of the disclosure.

FIG. 4 is schematic process diagram of a process fluid delivery system,according to one embodiment of the disclosure.

FIG. 5 is a cross-section view of the process fluid delivery system,illustrating a process flow sensor according to an embodiment of thedisclosure.

FIG. 6 is a cross-section view of a set of valves attached to themounting panel, illustrating interconnecting channels according to anembodiment.

FIG. 7 is a cross-section view of a reservoir and in-path process fluidcontrol components to the reservoir according to an embodiment of thedisclosure.

FIG. 8 is a cross-section view of the mounting panel generally along amid-line of the mounting panel according to an embodiment.

FIG. 9 is a flow chart of a method for operating a process fluiddelivery system that includes a diffusion-bonded mounting panel,according to various embodiments of the disclosure.

DETAILED DESCRIPTION OF EMBODIMENTS

Embodiments described herein are related to apparatuses, systems, andmethods for causing process fluid to flow through a diffusion-bondedmounting panel and corresponding process fluid delivery system. Inaddition to the above deficiencies in the current state of the art, manyfluid panels require an external reservoir to retain liquid or gas thatthen supplies the fluid panel with process fluid such as gas on anas-needed basis, for re-directing to a proper processing chamber. Theaddition of the external reservoir also adds complexity and takes upadditional space in a processing fab, which space is in more demand andbecoming more expensive over time.

Aspects of the present disclosure address the above and otherdeficiencies by providing a mounting panel that is designed andmanufactured from multiple metallic plates, and in which is integratedmultiple control flow paths. More specifically, each metallic plate canbe molded, cast, forged, machined, or carved to define differentcut-outs, vias, and orifices that, when combined with the other metalplates, form at least one reservoir along with multiple channels. Themultiple channels can be formed between the vias in a way that theprocess fluid flows through the vias, between the mounting panel anddifferent process fluid control components such as inlet ports, outputports, valves, filters, regulators, mass flow controllers, and the like.At least a pair of the multiple channels can be formed on differentsides of the reservoir in order to flow process fluid into and out ofthe reservoir.

In some embodiments, use of the reservoir and precision-formed viasand/or a dosing valve at an exit of the reservoir can replace a massflow controller. Because mass flow controllers are much larger, requireelectronics and electrical control, and are more expensive, employingthe disclosed integrated features to form at least one reservoir withinthe mounting panel can save on this expense and space. Further, bymounting a temperature control plate (such as a heating plate or acooling plate) on the bottom of the mounting panel, the process fluidwithin the reservoir, in the multiple channels, and throughout theattached process fluid control components can be maintained at aconstant temperature without the expense and space of a separateexternal heater or cooler. Other advantages will be apparent to thoseskilled in the art of process fluid panels and associated process fluiddelivery systems discussed hereinafter.

FIG. 1A is an exploded perspective view of a diffusion-bonded mountingpanel 105 and corresponding process fluid delivery system 100, accordingto an embodiment of the disclosure. FIG. 1B is a perspective view of theassembled diffusion-bonded mounting panel 105 and corresponding processfluid delivery system 100 of FIG. 1A according to an embodiment of thedisclosure. FIG. 1C is a top, plan view of the assembleddiffusion-bonded mounting panel 105 and corresponding process fluiddelivery system 100 of FIG. 1A according to an embodiment of thedisclosure.

The mounting panel 105 can include a top plate 102, a bottom plate 106,and one or more intermediate plates such as an inner plate 104. Thus,the mounting panel, although not illustrated, can include multiple innerplates 104. Also reference to “top” and “bottom” are for ease ofexplanation, but can be switched or understood to be generally a firstexternal plate and a second external plate of the mounting panel 105,respectively. The top plate 102, the bottom plate 106, and the one ormore intermediate plates can be made of metal. For example, the innerplate 104 can be compacted between the top plate 102 and the bottomplate 106 to form an integral metallic body in which to contain and flowthe process fluid, e.g., effectively replacing existing process fluidpanels such as gas panels. In one embodiment, the top plate 102, thebottom plate 106, and the one or more intermediate plates are diffusionbonded, e.g., via a method of diffusion bonding of steel and steelalloys under high temperature and high vacuum pressure. One example ofdiffusion bonding that can be used is disclosed with reference to U.S.Pat. No. 7,798,388, issued Sep. 21, 2010, which is herein incorporatedby this reference in its entirety.

In some embodiments, the mounting panel 105 further includes atemperature-controlled plate 160 attached to a bottom of the mountingpanel 105, e.g., to an external face of the bottom plate 106. Thistemperature-controlled plate 160 can have a very low profile and thusnot take up much space. The temperature-controlled plate 160, which willbe discussed in more detail, can be a heating plate, a cooling plate, ora combination thereof, designed to impart one of heat or cooling to themounting panel 105. In some embodiments, the temperature-controlledplate 160 is also diffusion bonded to the external face of the bottomplate 106.

With additional reference to FIGS. 2-3 , FIG. 2 is a bottom perspectiveview of the top plate 102 of the mounting panel 105 according to anembodiment. FIG. 3 is a bottom perspective view of the inner plate 104of the mounting panel 105 according to an embodiment. In someembodiments, the top plate 102 includes multiple vias 103 and multipleorifices 101. The multiple vias 103 can be adapted for passing theprocess fluid through the top plate 102 and, in some embodiments, atleast some of the multiple vias 103 vary in size to cause differentrates of flow of the process fluid through different fluid control pathsof the mounting panel 105. The multiple orifices 101 can be adapted forattaching a number of process fluid control components to the mountingpanel 105. In some embodiments, the orifices 101 are internal to themultiple vias 103 or any of multiple channels 209. In variousembodiments, each of the multiple vias 103 can generally be larger indiameter than each of the multiple orifices 101, as the vias 103 aredesigned (e.g., sized) to flow process fluid into and out of themounting panel 105, as will be described. In contrast, the multipleorifices 101 can be designed (e.g., sized) to receive attachmentmechanisms such as machine screws or bolts to attachment the processfluid control components to the top plate 102.

In disclosed embodiments, the top plate 102 also includes a firstcut-out region 207 (FIG. 2 ) and multiple channels 209 through which toflow the process fluid within the mounting panel 105. In one embodiment,the first cut-out region 207 is a reservoir. The channels of themultiple channels 209 can be formed of different shapes, includingcircular, semi-circulator, V-shaped, and the like. The inner plate 104also includes some of the multiple vias 103 and can optionally include asecond cut-out region 107. In some embodiments, the first cut-out region207 and the second cut-out region 107 correspond (after diffusionbonding) to form a reservoir (best seen in FIGS. 7-8 ).

In various embodiments, the reservoir (whether formed within only oneplate or multiple plates) is used to store a process fluid, such as gas,or can be used to store a liquid that is then converted to a gas beforeflowing the gas elsewhere within the process fluid delivery system 100.The conversion can be facilitated via heating the mounting panel as willbe discussed in more detail. The reservoir can also be used as areference volume to calibrate flow parameters and to troubleshoot andtune process recipes. Additionally, the inner plate 104 can also includemultiple channels 309 formed on an internal face of the inner plate 104,as illustrated in FIG. 3 . These channels 309 can communicate throughthe vias 103 in the top plate 102 and the inner plate 104. In someembodiments, the multiple channels 309 are omitted and thus areoptional. In other embodiments, additional ones of multiple inner platesalso include channels.

With additional reference to FIG. 2 , the internal face of the top plate102 can include a number of grooves 222 that define separations betweenchannels and process fluid paths, for example. The grooves 222 can beused as a leak check to determine leak integrity of the diffusion bondand prevent cross-talk between adjacent ones of the multiple channels209.

In some embodiments, the multiple channels 209 includes a first channel209A that leads into the reservoir from a first side of the reservoirand a second channel 209B that exits from a second side of thereservoir. Further, the multiple vias 103 can include at least oneprecision-sized via 103A positioned at an exit of the second channel209B and designed to control a flow rate of the process fluid that exitsthe reservoir. Additionally, the multiple vias 103 can include a largeror rectangular via 103B through which to insert a flow sensor 130. Insome embodiments, the multiple channels 109 also includes at least onereduce-sized channel 211. Other sizes are envisioned. In this way,varying sizes of the multiple channels 109 enables various flow ratesthat might be required by different processes, and can be achieved viaconfiguring a process fluid flow path that includes a mixture of variouschannel sizes.

In various embodiments, the process fluid delivery system 100 includes anumber of process fluid control components attached to the mountingpanel 105, e.g., attached to the top of the top plate 102 using themultiple orifices 101. These process fluid control components caninclude, but not be limited to, inlet ports 110A, valves 114A coupledwith the inlet ports 110A, outlet ports 110B, valves 114B coupled withthe outlet ports 110B, filter 116, pressure regulators 120, mass flowcontrollers 124, at least one flow sensor 130, at least one temperaturesensor 134, and at least one pressure sensor 136. Although notillustrated, the process fluid control components can also includesampling ports and other measurements sensors, e.g., an infrared sensorto detect composition of the process fluid.

In some embodiments, a set of the inlet ports 110A can be attached to atop of the mounting panel 105 while a set of the outlet ports 110B canalso be attached to the top of the mounting panel. The set of inletports 110A and the set of outlet ports 110B can be attached such thatconnectors of the ports extend beyond the mounting panel 105 for easyaccess. The set of inlet ports can receive the process fluid while theset of outlet ports can output the process fluid from the mounting panel105.

In some embodiments, the first cut-out region 207 includes protrusions201A through which to attach the temperature sensor 134 and protrusions201B through which to attach the pressure sensor 138. In theseembodiments, the multiple vias 103 include a first via 203A that leadsinto the first cut-out region 207, the first via 203A adapted to be influid communication with the temperature sensor 134, and a second via203B that leads into the first cut-out region 207, the second via 203Badapted to be in fluid communication with the pressure sensor 138. Beingin fluid communication can generally refer to being in contact with theprocess fluid. In some implementations, a sensing portion of thetemperature sensor is inserted through the first via 203A and a sensingportion of the pressure sensor 138 is inserted through the second via203B. In this way, the temperature sensor 134 and the pressure sensor138 are in fluid communication with the process fluid contained in thereservoir and able to detect the temperature and pressure of the processfluid within the reservoir.

In various embodiments, different ones of the multiple vias 103 lead toeach respective ones of the multiple channels 209, each via beingadapted to be in fluid communication with one of the inlet ports 110A,the flow sensor 130, a pressure regulator 120, a filter 116, one of thevalves 114A, 114B, or one of the outlet ports 110B. In this way, theprocess fluid can flow via one of many possible process fluid paths,e.g., starting at an inlet port 110A flows through a first channel, fromthe first channel flows into a valve 114A, from the valve 114A flowsinto a second channel, from the second channel flows into a pressureregular 120 or a filter 116, from the pressure regulator 120 or thefilter 116 flows into a third channel, and from the third channel theprocess fluid flows into a reservoir or a mass flow controller 124. Thereservoir or the mass flow controller 124 can further control theprocess fluid as the process fluid flows further into a fourth channel,where the process fluid flows from the fourth channel into a valve 114B,from the valve 114B the process fluid flows into a fifth channel, andfrom the fifth channel the process fluid flows out through the outletport 110B. These are some possible flow paths as the process fluid flowsfrom left to right in FIG. 1C, e.g., from the inlet ports 110A to theoutlet ports 110B, but different paths that include different processfluid control components or different arrangements of the same processfluid control components are envisioned.

FIG. 4 is schematic process diagram of a process fluid delivery system400, according to one embodiment of the disclosure. The process fluiddelivery system 400 includes a number of the same or similar processfluid control components as illustrated in FIGS. 1A-1C, which can beconnected through the multiple vias 103 and the multiple channels 209and 309. For example, the process fluid delivery system 400 includes aset of inlet ports 410A, at least one outlet port 410B, multiple valves414A coupled with the inlet ports 410A, and multiple filters 416 coupledwith the multiple valve 414A. In some process fluid paths, a pressureregulator 420 is interposed between a valve 414A and a filter 416.

In one embodiment, an additional channel 450, which can be one of themultiple channels 309, is connected between two of the multiple channels209 and includes one or more additional valve 414A in fluidcommunication with the additional channel 450. The additional channel450 can enable selective cross-mixture of process fluid between two ofthe multiple channels 209. Further, one of the multiple channels 309 canbe coupled between at least two of the valves 414B that lead to theoutlet port 110B, e.g., in order to selectively cross-mix process fluidand/or share the outlet port 110B for flowing the process fluid out ofthe mounting panel 105.

With additional reference to FIG. 4 , each of a set of mass flowcontroller 424 can be coupled with one of the filters 416. As discussedpreviously, instead of a mass flow controller 424, a reservoir 421 canbe formed in the mounting panel 105. Because mass flow controllers aremuch larger, require electronics and electrical control, and are moreexpensive, employing the integrated features to form the reservoir 421within the mounting panel 105 can save on this expense as well as saveon previous real estate required for a fluid control panel. In someembodiments, instead of the reservoir 421, one or more of the multiplechannels 209 or 309 can be expanded in width and shortened in length.Such a modified channel or set of channels can provide higher feedpressure of the process fluid while still providing a location forcontaining, under specific temperature and pressure, the process fluid.One or more valves can be employed, e.g., at the entrance and/or exit ofthe modified channel(s) to control the flow into and out of the modifiedchannel(s) that would replace the reservoir.

In some embodiments, each of a set of valves 414B can be connectedbetween either the reservoir 421, one of the mass flow controllers 424,or a flow sensor 430 and one of the outlets 410B. As can be seen in FIG.4 , multiple flow control paths can be configured within the processfluid delivery system 400. For example, the multiple orifices 101 can beemployed to alter the design and set of process fluid control componentsattached to and integrated with the mounting panel 105 to generate adifferent process fluid delivery system.

FIG. 5 is a cross-section view of the process fluid delivery system 100,illustrating the process flow sensor 130 according to an embodiment ofthe disclosure. As illustrated, the flow sensor 130 can be locatedwithin the larger or rectangular via 103B illustrated in FIG. 1A. Aprotruded portion 530 of the flow sensor 130 can be the portion of theflow sensor 130 that actually passes inside of the channel 109 to detecta flow rate of the process fluid within the channel 109.

In some embodiments, the process fluid delivery system 100 furtherincludes a first inlet port of the set of inlet ports 110A attached tothe top of the mounting panel 105 and in fluid communication with afirst channel 105A of the multiple channels 209 through a third via ofthe multiple vias 103. A valve 114A can be attached to the top of themounting panel 105, the valve in fluid communication with: the firstchannel 509A through a fourth via of the multiple vias; and a secondchannel 509B of the multiple channels 209 through a fifth via of themultiple vias 103.

Further, a filter 116 can be attached to the top of the mounting panel105, the filter in fluid communication with: the second channel 509Bthrough a sixth via of the multiple vias 103 and a third channel 509Cthat is also in fluid communication with the flow sensor 130. In theseembodiments, the flow sensor 130 is attached to a top of the mountingpanel 105 and the flow sensor 130 is in fluid communication with thethird channel 509A of the multiple channels 209 through a seventh via ofthe multiple vias 103, e.g., through the rectangular via 103B. The flowsensor 130 can sense a rate of flow of the process fluid through thefirst channel 509A. Another valve 114B can be attached to the mountingpanel 105 and in fluid communication with the third channel 509C andwith a channel 509D of the multiple channels 309, which can carry theprocess fluid to another of the valves 114B.

FIG. 6 is a cross-section view of the set of valves 114B attached to themounting panel 105, illustrating interconnecting channels according toan embodiment. As illustrated, each valve 114B is connected to one ofthe multiple channels 109 formed in the top plate 102, but some of thevalves 114B area also connected to one of the multiple channels 309formed in the inner plate 104. These multiple channels 309 cross-couplesome of the valves 114B in order to cross-mix process fluid and/or toshare an outlet port 110B.

FIG. 7 is a cross-section view of a reservoir 721 and in-path processfluid control components to the reservoir 721 according to an embodimentof the disclosure. As discussed with reference to FIGS. 1A-1C and FIG. 2, the first cut-out 207 in the top plate 102 and the second cut-out 107in the inner plate 106 can be combined to correspond within the mountingpanel 105, thus forming the reservoir 721. Further, atemperature-controlled plate 760 can be attached to a bottom of themounting panel 105, e.g., to the external face of the bottom plate 106.This temperature-controlled plate 760 can have a very low profile andthus not take up much space.

In various embodiments, the temperature-controlled plate 760 can be aheating plate, a cooling plate, or a combination thereof, designed toimpart one of heat or cooling to the mounting panel 105. In someembodiments, the temperature-controlled plate 760 is also diffusionbonded to the external face of the bottom plate 106. In this way,because the mounting panel 105 is an integrated, diffusion-bonded set ofmetal plates, the process fluid flowing through the mounting panel 105can be maintained at a consistent temperature and pressure without theexpense and space of an external temperature unit such as an externalheater unit and associated thermocouples. Keeping the process fluid at aconsistent temperature and pressure can ensure the process fluid remainsin a gaseous state for transfer from the mounting panel 105 into one ormore processing chambers or other destination. Through the use of thetemperature sensor 134 and the pressure sensor 138, a control unit ofthe process fluid delivery system 100 can track the temperature andpressure within the reservoir 721 and trigger adjustments in real-timevia the temperature-controlled plate 760, e.g., in order to maintainthat consistent temperature and/or pressure despite environmental and/orcomponent-related changes.

With additional reference to FIG. 7 , in one embodiment, a first inletport of the set of inlet ports 110A is attached to the top of themounting panel 105 and in fluid communication with a first channel 709Aof the multiple channels 209 through a second via of the multiple vias103. Further, a valve 114A can be attached to the top of the mountingpanel 105. The valve 114A can be in fluid communication with: the firstchannel 709A through a third via of the multiple vias 103; and a secondchannel 709B of the multiple channels 209 through a fourth via of themultiple vias 103. A pressure regulator 120 can be attached to the topof the mounting panel 105. The pressure regulator 120 is in fluidcommunication with: the second channel 709B through a fifth via of themultiple vias 103; and a third channel 709C of the multiple channels 209through a sixth via of the multiple vias 103. In this embodiment, thethird channel 709C is one of the pair of the multiple channels, e.g., isthe first channel 209A (FIG. 2 ).

In one embodiment, a valve 114B is attached to the top of the mountingpanel 105, the valve in fluid communication with: a fourth channel 709Dof the multiple channels 209 through a sixth via of the multiple vias103 and with a fifth channel 709E of the multiple channels 209 through aseventh via of the multiple vias 103. In one embodiment, the fourthchannel 709D is one of the pair of the multiple channels, e.g., is thesecond channel 209B (FIG. 2 ). In one embodiment, the fifth channel 709Eis in one of the multiple channels 309 in the inner plate 104. The atleast one outlet port 110B is attached to the top of the mounting panel105 and in fluid communication with the fifth channel 709E. In relatedembodiments, the valve 114B is a dosing valve that is variablycontrollable to adjust a flow rate of the process fluid through thevalve 114B, or the third channel 709C is of a different size than thesecond channel 709B or the first channel 709A.

FIG. 8 is a cross-section view of the mounting panel 105 generally alonga mid-line of the mounting panel according to an embodiment. Thiscross-section view has a number of features already illustrated anddiscussed within the mounting panel 105, but illustrates how, in oneembodiment, a first via 803A of the multiple vias 103 can go through thetop plate 102 to a channel 209 of the top plate 102 (FIG. 2 ) while asecond via 803B of the multiple vias 103 can go through the top plate102 and the inner plate 104 to a channel 309 of the inner plate 104(FIG. 3 ). In this way, the various vias of the top plate 102 and theinner plate 104 (or other intermediate plate) can lead to one of acombination of the multiple channels 209 and 309. It would be apparentto one skilled in the art that additional intermediate plates couldinclude additional channels and vias in order to build out a morecomplicated 3D mounting panel that includes additional reservoirs andchannels in order to replace even more of the mass flow controllers andother control valves by building their functionality into the mountingpanel.

FIG. 9 is a flow chart of a method 900 for operating a process fluiddelivery system that includes a diffusion-bonded mounting panel,according to various embodiments of the disclosure. For example, theprocess fluid delivery system 100 can include a mounting panel thatforms a reservoir to contain a process fluid, multiple channels throughwhich to flow the process fluid, multiple vias between a top of themounting panel and the reservoir and between the top of the mountingpanel and the multiple channels. The process fluid delivery system canfurther include a pressure sensor attached to a top of the mountingpanel and that is in fluid communication with the reservoir. Further,the process fluid delivery system 100 can include a temperature sensorattached to the top of the mounting panel and that is in fluidcommunication with the reservoir.

At operation 910, the system causes the process fluid to flow from aninlet port through a first channel of the multiple channels.

At operation 920, the system causes the process fluid to flow from thefirst channel through a first valve into a second channel of themultiple channels. In some embodiments, the system causes the processfluid to flow from the second channel directly into the reservoir. Inother embodiments, the process fluid optionally also flows through thepressure regulator before flowing into the reservoir, which is operation930.

At operation 930, the system causes the process fluid to flow from thesecond channel through a pressure regulator into a third channel of themultiple channels, the third channel in fluid communication with thereservoir.

At operation 940, the system determines, using the pressure sensor, apressure of the process fluid within the reservoir.

At operation 950, the system further determines, using the temperaturesensor, a temperature of the process fluid within the reservoir.

At operation 960, the system causes the process fluid to flow from thereservoir into a fourth channel of the multiple channels.

At operation 970, the system causes the process fluid to flow from thefourth channel through a second valve into a fifth channel of themultiple channels.

At operation 980, the system adjusts a flow rate of the process fluidthrough the second valve based on the temperature and the pressure ofthe process fluid in the reservoir.

At operation 990, the system causes the process fluid to flow from thefifth channel out through an outlet port. In various embodiments,operations 950 through 990 are optional.

The preceding description sets forth numerous specific details such asexamples of specific systems, components, methods, and so forth in orderto provide a good understanding of several embodiments of the presentdisclosure. It will be apparent to one skilled in the art, however, thatat least some embodiments of the present disclosure may be practicedwithout these specific details. In other instances, well-knowncomponents or methods are not described in detail or are presented insimple block diagram format in order to avoid unnecessarily obscuringthe present disclosure. Thus, the specific details set forth are merelyexemplary. Particular implementations may vary from these exemplarydetails and still be contemplated to be within the scope of the presentdisclosure.

Reference throughout this specification to “one embodiment” or “anembodiment” means that a particular feature, structure, orcharacteristic described in connection with the embodiment is includedin at least one embodiment. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment” in various places throughout thisspecification are not necessarily all referring to the same embodiment.In addition, the term “or” is intended to mean an inclusive “or” ratherthan an exclusive “or.” When the term “about” or “approximately” is usedherein, this is intended to mean that the nominal value presented isprecise within ±10%.

Although the operations of the methods herein are shown and described ina particular order, the order of operations of each method may bealtered so that certain operations may be performed in an inverse orderso that certain operations may be performed, at least in part,concurrently with other operations. In another embodiment, instructionsor sub-operations of distinct operations may be in an intermittentand/or alternating manner.

It is understood that the above description is intended to beillustrative, and not restrictive. Many other embodiments will beapparent to those of skill in the art upon reading and understanding theabove description. The scope of the disclosure should, therefore, bedetermined with reference to the appended claims, along with the fullscope of equivalents to which such claims are entitled.

What is claimed is:
 1. A system comprising: a mounting panel comprisinga plurality of diffusion-bonded metal plates that form: a reservoir tocontain a process fluid; multiple channels through which to flow theprocess fluid, wherein at least a pair of the multiple channels areconnected with the reservoir; and a plurality of vias through which toflow the process fluid to and from process fluid control componentsattached to the mounting panel; a temperature sensor attached to a topof the mounting panel, the temperature sensor in fluid communicationwith the reservoir through one of the plurality of vias; a set of inletports attached to the mounting panel, the set of inlet ports to receivethe process fluid; and at least one outlet port attached to the mountingpanel, the at least one outlet port to output the process fluid from themounting panel.
 2. The system of claim 1, further comprising a pressuresensor attached to a top of the mounting panel, the pressure sensor influid communication with the reservoir through a second of the pluralityof vias.
 3. The system of claim 1, wherein the mounting panel furthercomprises a plurality of orifices that are sized and adapted forattaching process fluid control components to the mounting panel,wherein the process fluid control components comprise at least thetemperature sensor, the set of inlet ports, and the at least one outletport.
 4. The system of claim 3, wherein the plurality ofdiffusion-bonded metal plates comprise: a top plate having the pluralityof vias and the plurality of orifices, wherein an internal face of thetop plate includes a first cut-out region and a plurality of themultiple channels, and the plurality of vias are sized and adapted forpassing the process fluid; an inner plate also having some of theplurality of vias and a second cut-out region, the first cut-out regionand the second cut-out region forming the reservoir; and a bottom plate,wherein the inner plate is compacted between the top plate and the innerplate to form an integral metallic body in which to contain and flow theprocess fluid.
 5. The system of claim 1, further comprising atemperature-controlled plate attached to a bottom of the mounting panel,the temperature-controlled plate to impart one of heat or cooling to themounting panel.
 6. The system of claim 1, further comprising: a firstinlet port of the set of inlet ports attached to the top of the mountingpanel and in fluid communication with a first channel of the multiplechannels through a second via of the plurality of vias; a valve attachedto the top of the mounting panel, the valve in fluid communication with:the first channel through a third via of the plurality of vias; and asecond channel of the multiple channels through a fourth via of theplurality of vias; and a pressure regulator attached to the top of themounting panel, the pressure regulator in fluid communication with: thesecond channel through a fifth via of the plurality of vias; and a thirdchannel of the multiple channels through a sixth via of the plurality ofvias, wherein the third channel is one of the pair of the multiplechannels.
 7. The system of claim 1, further comprising: a valve attachedto the top of the mounting panel, the valve in fluid communication with:a first channel of the multiple channels through a second via of theplurality of vias, wherein the first channel is one of the pair of themultiple channels; and a second channel of the multiple channels througha third via of the plurality of vias; and wherein the at least oneoutlet port is attached to the top of the mounting panel and in fluidcommunication with the second channel.
 8. The system of claim 7, whereinat least one of: the valve is a dosing valve that is variablycontrollable to adjust a flow rate of the process fluid through thevalve; or the first channel is of a different size than the secondchannel.
 9. The system of claim 1, further comprising a flow sensorattached to a top of the mounting panel, the flow sensor in fluidcommunication with a first channel of the multiple channels through asecond via of the plurality of vias, wherein the flow sensor is to sensea rate of flow of the process fluid through the first channel.
 10. Thesystem of claim 9, further comprising: a first inlet port of the set ofinlet ports attached to the top of the mounting panel and in fluidcommunication with a second channel of the multiple channels through athird via of the plurality of vias; a valve attached to the top of themounting panel, the valve in fluid communication with: the secondchannel through a fourth via of the plurality of vias; and a thirdchannel of the multiple channels through a fifth via of the plurality ofvias; and a filter attached to the top of the mounting panel, the filterin fluid communication with: the third channel through a sixth via ofthe plurality of vias; and the first channel that is also in fluidcommunication with the flow sensor.
 11. A system comprising: a mountingpanel comprising a plurality of diffusion-bonded metal plates that form:a reservoir to contain a process fluid; multiple channels through whichto flow the process fluid, wherein at least a pair of the multiplechannels are connected with the reservoir; and a plurality of viasthrough which to flow the process fluid to and from process fluidcontrol components attached to the mounting panel; a pressure sensorattached to a top of the mounting panel, the pressure sensor in fluidcommunication with the reservoir through at least one of the pluralityof vias; a set of inlet ports attached to the mounting panel, the set ofinlet ports to receive the process fluid; and at least one outlet portattached to the mounting panel, the at least one outlet port to outputthe process fluid from the mounting panel.
 12. The system of claim 11,further comprising a temperature sensor attached to a top of themounting panel, the temperature sensor in fluid communication with thereservoir through at least a second of the plurality of vias.
 13. Thesystem of claim 11, further comprising a temperature-controlled plateattached to a bottom of the mounting panel, the temperature-controlledplate to impart one of heat or cooling to the mounting panel.
 14. Thesystem of claim 11, further comprising: a first inlet port of the set ofinlet ports attached to the top of the mounting panel and in fluidcommunication with a first channel of the multiple channels through asecond via of the plurality of vias; a valve attached to the top of themounting panel, the valve in fluid communication with: the first channelthrough a third via of the plurality of vias; and a second channel ofthe multiple channels through a fourth via of the plurality of vias; anda pressure regulator attached to the top of the mounting panel, thepressure regulator in fluid communication with: the second channelthrough a fifth via of the plurality of vias; and a third channel of themultiple channels through a sixth via of the plurality of vias, whereinthe third channel is one of the pair of the multiple channels.
 15. Thesystem of claim 11, further comprising: a valve attached to the top ofthe mounting panel, the valve in fluid communication with: a firstchannel of the multiple channels through a second via of the pluralityof vias, wherein the first channel is one of the pair of the multiplechannels; a second channel of the multiple channels through a third viaof the plurality of vias; and wherein the at least one outlet port isattached to the top of the mounting panel and in fluid communicationwith the second channel; and wherein at least one of: the valve is adosing valve that is variably controllable to adjust a flow rate of theprocess fluid through the valve; or the first channel is of a differentsize than the second channel.
 16. The system of claim 11, furthercomprising a flow sensor attached to a top of the mounting panel, theflow sensor in fluid communication with a first channel of the multiplechannels through a second via of the plurality of vias, wherein the flowsensor is to sense a rate of flow of the process fluid through the firstchannel.
 17. The system of claim 16, further comprising: a first inletport of the set of inlet ports attached to the top of the mounting paneland in fluid communication with a second channel of the multiplechannels through a third via of the plurality of vias; a valve attachedto the top of the mounting panel, the valve in fluid communication with:the second channel through a fourth via of the plurality of vias; and athird channel of the multiple channels through a fifth via of theplurality of vias; and a filter attached to the top of the mountingpanel, the filter in fluid communication with: the third channel througha sixth via of the plurality of vias; and the first channel that is alsoin fluid communication with the flow sensor.
 18. A method of operating aprocess fluid delivery system that comprises a mounting panel that formsa reservoir to contain a process fluid, multiple channels through whichto flow the process fluid, a plurality of vias between a top of themounting panel and the reservoir and between the top of the mountingpanel and the multiple channels, wherein the system further comprises apressure sensor attached to a top of the mounting panel and that is influid communication with the reservoir, wherein the method of operatingthe process fluid delivery system comprises: causing the process fluidto flow from an inlet port through a first channel of the multiplechannels; causing the process fluid to flow from the first channelthrough a first valve into a second channel of the multiple channels,the second channel in fluid communication with the reservoir;determining, using the pressure sensor, a pressure of the process fluidwithin the reservoir; and causing the process fluid to flow from thereservoir into a third channel of the multiple channels.
 19. The methodof claim 18, wherein the method of operating the process fluid deliverysystem further comprises causing the process fluid to flow from thesecond channel through a pressure regulator into a fourth channel of themultiple channels, wherein the fourth channel is in fluid communicationwith the reservoir.
 20. The method of claim 18, wherein the processfluid delivery system further comprises a temperature sensor attached tothe top of the mounting panel and that is in fluid communication withthe reservoir, the method of operating the process fluid delivery systemfurther comprises: determining, using the temperature sensor, atemperature of the process fluid within the reservoir; causing theprocess fluid to flow from the third channel through a second valve intoa fourth channel of the multiple channels; and adjusting a flow rate ofthe process fluid through the second valve based on the temperature andthe pressure of the process fluid in the reservoir.